Methods of forming patterns using compositions for an underlayer of photoresist
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United States of America Patent
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Jul 14, 2020
Grant Date -
Jul 13, 2017
app pub date -
Jan 13, 2017
filing date -
Jan 13, 2016
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Abstract
A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
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