Chamber wall heating for a millisecond anneal system

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United States of America Patent

PATENT NO 10957563
APP PUB NO 20170194175A1
SERIAL NO

15380191

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Abstract

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Systems and methods for reducing contamination on reflective mirrors disposed on chamber walls in a millisecond anneal system are provided. In one example implementation, the reflective mirrors can be heated by one or more of (1) heating the fluid in the closed fluid system for regulating the temperature of the reflective mirrors; (2) electrical cartridge heater(s) or heater ribbon(s) attached to the reflective mirrors; and/or (3) use of lamp light inside the chamber.

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Patent Owner(s)

Patent OwnerAddress
MATTSON TECHNOLOGY INC47131 BAYSIDE PARKWAY FREMONT CA 94538
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO LTDNO 8 BUILDING NO 28 JINGHAI ER RD BEIJING 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Janisch, Joachim Roggenburg, DE 1 3
Mueller, Manuel Neu-Ulm, DE 13 18

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