Features for improving process uniformity in a millisecond anneal system
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United States of America Patent
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Sep 8, 2020
Grant Date -
Jul 6, 2017
app pub date -
Dec 14, 2016
filing date -
Dec 30, 2015
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Abstract
Systems and methods for improving process uniformity in a millisecond anneal system are provided. In some implementations, a process for thermally treating a substrate in a millisecond anneal system can include obtaining data indicative of a temperature profile associated with one or more substrates during processing in a millisecond anneal system. The process can include one or more of (1) changing the pressure inside the processing chamber of the millisecond anneal system; (2) manipulating the irradiation distribution by way of the refracting effect of a water window in the millisecond anneal system; (3) adjusting the angular positioning of the substrate; and/or (4) configuring the shape of the reflectors used in the millisecond anneal system.
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