Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method
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United States of America Patent
Stats
-
May 19, 2020
Grant Date -
Jul 6, 2017
app pub date -
Apr 23, 2015
filing date -
May 6, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 19, 2027 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 19, 2031 |
