PRECONCENTRATOR FOR ABSORBING/DESORBING AT LEAST ONE COMPONENT OF GAS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

SERIAL NO

15325178

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The disclosure pertains to a microstructure for adsorbing/desorbing at least one gas component of a gas supplied to the microstructure. The microstructure includes a semiconductor substrate having a bottom and a top. The microstructure also includes a plurality of micro-channels, extending from the bottom to the top of the semiconductor substrate. A top surface of micro-channel is configured to adsorb and/or desorb the at least one gas component when the gas is passed through the micro-channels.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SIEMENS AKTIENGESELLSCHAFTWERNER-VON-SIEMENS-STRASSE 1 MUENCHEN D-80333

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
EISELE, Ignaz Icking, DE 19 152
FLEISCHER, Maximilian Höhenkirchen, DE 77 757
HEDLER, Harry Germering, DE 122 2393
SCHIEBER, Markus München, DE 11 39
ZAPF, Jörg München, DE 19 70

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation