SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Jun 29, 2017
app pub date -
Mar 16, 2016
filing date -
Dec 25, 2015
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Abstract
A substrate processing apparatus, including: a process chamber configured to process a substrate, a transfer chamber adjoining the process chamber, a shaft installed in the transfer chamber, a substrate mounting stand connected to the shaft and including a heating part, a first thermal insulation part installed in a wall of the transfer chamber at a side of the process chamber, and a second thermal insulation part installed in the shaft at a side of the substrate mounting stand.
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