METHODS FOR ATOM INCORPORATION INTO MATERIALS USING A PLASMA AFTERGLOW

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United States of America Patent

SERIAL NO

15327503

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Abstract

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There are provided non-destructive methods for incorporating an atom such as N into a material such as graphene. The methods can comprise subjecting a gas comprising the atom to conditions to obtain a flowing plasma afterglow then exposing the material to the flowing plasma afterglow. There are also provided materials such as N-doped graphene produced by such methods.

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Patent Owner(s)

Patent OwnerAddress
VALORISATION-RECHERCHE LIMITED PARTNERSHIPMONTRÉAL QUÉBEC H3T 1P1

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AFONSO-FERREIRA, Jason Montréal, CA 1 0
LEONELLI, Richard Montréal, CA 1 0
STAFFORD, Luc Montréal, CA 3 0
VANDSBURGER, Leron Montréal, CA 2 7

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