RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM

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United States of America Patent

SERIAL NO

15458229

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Abstract

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A resist composition containing a compound represented by the general formulas (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, an alcoholic compound that can be derived therefrom, and a method for producing an alcoholic compound represented by general formulas (6) or (7) are described.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL CONot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ECHIGO, Masatoshi Hiratsuka-shi, JP 137 625
YAMAKAWA, Masako Hiratsuka-shi, JP 10 137

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