SUBSTRATE CARRIER THAT CARRIES A SUBSTRATE ON EACH OF TWO BROAD SIDES OF THE SUBSTRATE CARRIER THAT FACE AWAY FROM EACH OTHER
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United States of America Patent
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Issued Date -
Jun 22, 2017
app pub date -
Mar 18, 2015
filing date -
Mar 24, 2014
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Abstract
A substrate carrier is configured to be arranged in a CVD or PVD reactor, in particular for the deposition of carbon nanotubes or graphene. The substrate carrier has a first broadside surface and a second broadside surface facing away from the first broad-side surface. The first broadside surface and the second broadside surface of the substrate carrier each have a substrate accommodation zone. Fastening elements are provided within each of the substrate accommodation zones to secure a substrate or sections of a substrate to one or more of the broadside surfaces. A CVD reactor is further configured to receive the substrate carrier.
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