X-RAY ILLUMINATORS WITH HIGH FLUX AND HIGH FLUX DENSITY

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United States of America Patent

SERIAL NO

15431786

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

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Patent Owner(s)

Patent OwnerAddress
SIGRAY INC5750 IMHOFF DRIVE SUITE I CONCORD CA 94520

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kirz, Janos Berkeley, US 51 1475
Lewis, Sylvia Jia Yun San Francisco, UA 45 1447
Yun, Wenbing Walnut Creek, US 99 3901

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