X-RAY ILLUMINATORS WITH HIGH FLUX AND HIGH FLUX DENSITY
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United States of America Patent
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app pub date -
Feb 14, 2017
filing date -
Dec 5, 2013
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Abstract
Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SIGRAY INC | 5750 IMHOFF DRIVE SUITE I CONCORD CA 94520 |
International Classification(s)

- 2017 Application Filing Year
- H01J Class
- 2316 Applications Filed
- 1735 Patents Issued To-Date
- 74.92 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Kirz, Janos | Berkeley, US | 51 | 1475 |
# of filed Patents : 51 Total Citations : 1475 | |||
Lewis, Sylvia Jia Yun | San Francisco, UA | 45 | 1447 |
# of filed Patents : 45 Total Citations : 1447 | |||
Yun, Wenbing | Walnut Creek, US | 99 | 3901 |
# of filed Patents : 99 Total Citations : 3901 |
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Patent Citation Ranking
- 34 Citation Count
- H01J Class
- 97.56 % this patent is cited more than
- 8 Age
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