ALD/PARYLENE MULTI-LAYER THIN FILM STACK
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United States of America Patent
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Jun 8, 2017
app pub date -
Nov 25, 2016
filing date -
Nov 24, 2015
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Abstract
Described herein is a multi-layer thin film stack including a first ALD layer of a first metal oxide deposited on a substrate surface of a substrate, a first parylene layer covering the first ALD layer, and a second ALD layer of a second metal oxide covering the first parylene layer. The multi-layer thin film stack further includes a second parylene layer covering the second ALD layer.
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