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Abstract

An improved ALD system usable for low vapor pressure liquid and sold precursors. The ALD system includes a precursor container and inert gas delivery elements configured to increase precursor vapor pressure within a precursor container by injecting an inert gas pulse into the precursor container while a precursor pulse is being removed to the reaction chamber. A controllable inert gas flow valve and a flow restrictor are disposed along an inert gas input line leading into the precursor container below its fill level. A vapor space is provided above the fill level. An ALD pulse valve is disposed along a precursor vapor line extending between the vapor space and the reaction chamber. Both valves are pulsed simultaneously to synchronously remove precursor vapor from the vapor space and inject inert gas into the precursor container below the fill level.

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First Claim