METHOD FOR APPLICATION OF A SILICON DIOXIDE LAYER
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United States of America Patent
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Jun 26, 2014
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Jun 26, 2014
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A method for depositing a silicon dioxide layer on a combustible and/or, in particular easily, inflammable carrier material (2, 2′) for the formation of a package, in particular suitable for foodstuffs, with the following steps, in particular with the following sequence: coating of the carrier material with a silicon dioxide precursor solution prepared by dissolving an oligomeric, silicate, preferably a silicic acid tetramethyl ester homopolymer, in a solvent, said silicon dioxide precursor solution having a water content less than 5 vol. %, and hardening of the silicon dioxide precursor solution and thus forming the silicon dioxide layer on the carrier material in an at least partially vaporous ammonia atmosphere at: a temperature between 5° C. and 30° C. and/or a pressure between 900 MPa and 1200 MPa.
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