Compact and low loss Y-junction for submicron silicon waveguide

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United States of America Patent

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14940097

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A compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguides. The design was performed using FDTD and particle swarm optimization (PSO). The device was fabricated in a 248 nm CMOS line. Measured average insertion loss is 0.28±0.02 dB across an 8-inch wafer. The device footprint is less than 1.2 μm×2 μm, orders of magnitude smaller than MMI and directional couplers.

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NOKIA SOLUTIONS AND NETWORKS OYESPOO FINLAND ESPOO SOUTHERN FINLAND

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baehr-Jones, Tom Arcadia, US 32 1064
Yang, Shuyu Jersey City, US 15 135
Zhang, Yi Jersey City, US 1881 15120

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