DIAPHRAGM VALVE, FLUID CONTROL DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICONDUCTOR MANUFACTURING METHOD

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United States of America Patent

APP PUB NO 20170130848A1
SERIAL NO

15322553

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Abstract

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A flat portion of a bottom surface of a depression of a body is provided with a spot facing so as to include a portion of a fluid outflow channel, which portion is open to the bottom surface of the depression.

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Patent Owner(s)

Patent OwnerAddress
FUJIKIN INCORPORATED3-2 ITACHIBORI 2-CHOME NISHI-KU OSAKA-SHI OSAKA 550-0012

International Classification(s)

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  • 2015 Application Filing Year
  • F16K Class
  • 1801 Applications Filed
  • 1435 Patents Issued To-Date
  • 79.68 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shikata, Izuru Osaka-shi, JP 23 578
Watanabe, Kazunari Osaka-shi, JP 55 399

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  • 4 Citation Count
  • F16K Class
  • 31.02 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges31867022761101 - 1011 - 2021 - 3031 - 4041 - 5071 - 80050100150200250300350400450500550600650700750

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