DIAPHRAGM VALVE, FLUID CONTROL DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND SEMICONDUCTOR MANUFACTURING METHOD
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United States of America Patent
Stats
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N/A
Issued Date -
May 11, 2017
app pub date -
Jun 17, 2015
filing date -
Jun 30, 2014
priority date (Note) -
Published
status (Latency Note)
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Importance

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Abstract
A flat portion of a bottom surface of a depression of a body is provided with a spot facing so as to include a portion of a fluid outflow channel, which portion is open to the bottom surface of the depression.
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
JP | B2 | JP6336345 | Jun 30, 2014 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PUBLISHED GRANTED PATENT (SECOND LEVEL) | ダイヤフラム弁、流体制御装置、半導体製造装置および半導体製造方法 | Jun 06, 2018 | |||
KR | A | KR20180123185 | Jun 17, 2015 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
UNEXAMINED PATENT APPLICATION | 다이어프램 밸브, 유체 제어 장치, 반도체 제조 장치 및 반도체 제조 방법 | Nov 14, 2018 | |||
KR | A | KR20160143832 | Jun 17, 2015 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
UNEXAMINED PATENT APPLICATION | 다이어프램 밸브, 유체 제어 장치, 반도체 제조 장치 및 반도체 제조 방법 | Dec 14, 2016 | |||
CN | A | CN106471298 | Jun 17, 2015 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
UNEXAMINED APPLICATION FOR A PATENT FOR INV. | Diaphragm valve, fluid control device, semiconductor- fabricating device and semiconductor making method | Mar 01, 2017 | |||
WO | A1 | WO2016002515 | Jun 17, 2015 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | ダイヤフラム弁、流体制御装置、半導体製造装置および半導体製造方法 | Jan 07, 2016 | |||
TW | B | TWI672458 | Jun 29, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT OR PATENT OF ADDITION | Diaphragm valve, fluid control device, semiconductor production device, and semiconductor production method | Sep 21, 2019 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
FUJIKIN INCORPORATED | 3-2 ITACHIBORI 2-CHOME NISHI-KU OSAKA-SHI OSAKA 550-0012 |
International Classification(s)

- 2015 Application Filing Year
- F16K Class
- 1801 Applications Filed
- 1435 Patents Issued To-Date
- 79.68 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Shikata, Izuru | Osaka-shi, JP | 23 | 578 |
# of filed Patents : 23 Total Citations : 578 | |||
Watanabe, Kazunari | Osaka-shi, JP | 55 | 399 |
# of filed Patents : 55 Total Citations : 399 |
Cited Art Landscape
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Patent Citation Ranking
- 4 Citation Count
- F16K Class
- 31.02 % this patent is cited more than
- 8 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 11, 2028 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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