HIGH VOLTAGE TRANSISTOR WITH SHORTENED GATE DIELECTRIC LAYER

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United States of America Patent

SERIAL NO

14930596

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Abstract

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A high voltage transistor includes a substrate, a well which is disposed within the substrate, a gate disposed on the well, a gate dielectric layer disposed between the well and the gate, two drift regions respectively disposed in the well at two sides of the gate, two source/drain regions respectively disposed within each drift region, wherein a width of the gate dielectric layer is smaller than a width of the source/drain region, and two isolation elements respectively disposed within each drift region

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Patent Owner(s)

Patent OwnerAddress
UNITED MICROELECTRONICS CORPNO 3 LI-HSIN ROAD 2 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsiao, Shih-Yin Chiayi County, TW 61 167
Yu, Kun-Huang New Taipei City, TW 33 92

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