BIPOLAR JUNCTION TRANSISTOR AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

SERIAL NO

15335877

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Abstract

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A bipolar junction transistor includes a first well region having a first conductive type, a second well region disposed adjacent to the first well region and having a second conductive type, a base disposed on the first well region and having the first conductive type, an emitter disposed on the first well region and having the second conductive type, and a collector disposed on the second well region and having the second conductive type. The first well region comprises a first impurity region and a second impurity region having an impurity concentration lower than that of the first impurity region. The base is disposed on the first impurity region, and the emitter is disposed on the second impurity region.

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Patent Owner(s)

Patent OwnerAddress
DB HITEK CO LTD432 TEHERAN-RO GANGNAM-GU SEOUL 06194

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Sung Bok Daejeon, KR 2 13
Gu, Sung Mo Chungcheongbuk-do, KR 3 15

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