Resistive Random Access Memory

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United States of America Patent

SERIAL NO

14957674

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Abstract

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A resistive random access memory overcomes the difficulty in reducing the forming voltage thereof. The resistive random access memory includes a first electrode layer, a separating portion, a lateral wall portion, an oxygen-containing rheostatic layer and a second electrode layer. The separating portion is arranged on the first electrode layer and forms a through-hole. The first electrode layer is exposed via the through-hole. The lateral wall portion is annularly arranged on an inner periphery of the separating portion defining the through-hole. The lateral wall portion is connected to the first electrode layer and includes a first dielectric. The oxygen-containing rheostatic layer covers the first electrode layer, the separating portion and the lateral wall portion. The oxygen-containing rheostatic layer includes a second dielectric smaller than the first dielectric. The second electrode layer is arranged on the oxygen-containing rheostatic layer. In this structure, the difficulty can be effectively overcome.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL SUN YAT-SEN UNIVERSITYNO 70 LIEN-HAI RD GUSHAN DISTRICT KAOHSIUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Kuan-Chang Kaohsiung City, TW 20 68
Chang, Ting-Chang Kaohsiung City, TW 114 1292
Chu, Tian-Jian Kaohsiung City, TW 7 29
Pan, Chih-Hung Kaohsiung City, TW 23 56
Tsai, Tsung-Ming Kaohsiung City, TW 25 114

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