METHOD FOR FORMATION OF VERTICAL CYLINDRICAL GaN QUANTUM WELL TRANSISTOR

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United States of America Patent

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15077867

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Abstract

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The present invention provides a method for forming a quantum well device having high mobility and high breakdown voltage with enhanced performance and reliability. A method for fabrication of a Vertical Cylindrical GaN Quantum Well Power Transistor for high power application is disclosed. Compared with the prior art, the method of forming a quantum well device disclosed in the present invention has the beneficial effects of high mobility and high breakdown voltage with better performance and reliability.

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Patent OwnerAddress
ZING SEMICONDUCTOR CORPORATIONNO 1000 YUNSHUI RD NICHENG TOWN PUDONG NEW AREA SHANGHAI 201306

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Richard R Shanghai, CN 26 119
Xiao, Deyuan Shanghai, CN 246 634

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