Trench MOSFET with self-aligned body contact with spacer

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United States of America Patent

PATENT NO 10903163
APP PUB NO 20170110404A1
SERIAL NO

15263882

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Abstract

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Trench MOSFET with self-aligned body contact with spacer. In accordance with an embodiment of the present invention, a semiconductor device includes a semiconductor substrate, and at least two gate trenches formed in the semiconductor substrate. Each of the trenches comprises a gate electrode. The semiconductor device also includes a body contact trench formed in the semiconductor substrate between the gate trenches. The body contact trench has a lower width at the bottom of the body contact trench and an ohmic body contact implant beneath the body contact trench. The horizontal extent of the ohmic body contact implant is not greater than the lower width of the body contact trench.

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Patent Owner(s)

Patent OwnerAddress
VISHAY-SILICONIX2201 LAURELWOOD ROAD SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guan, Lingpeng San Jose, US 95 1172
Jo, Seokjin Santa Clara, US 3 7
Terrill, Kyle Santa Clara, US 71 884

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