LASER IRRADIATION APPARATUS AND LASER IRRADIATION METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Dec 19, 2016
filing date -
Aug 28, 2014
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A laser irradiation apparatus may include a plasma generator, a laser unit configured to output a pulsed laser light beam, and a controller. The plasma generator may be configured to supply an atmospheric pressure plasma containing a dopant to a predetermined region on a semiconductor material. The controller may be configured to control the plasma generator and the laser unit to perform one of first and second controls to thereby perform doping of the dopant into the semiconductor material. The first control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam from start to finish of supply of the atmospheric pressure plasma to the predetermined region. The second control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam after supply of the atmospheric pressure plasma to the predetermined region.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully