ACRYLIC ACID-BASED POLYMER COMPOSITION, METHOD FOR PRODUCING SAME, AND USE THEREFOR

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United States of America Patent

SERIAL NO

15381139

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Abstract

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An acrylic acid-based polymer composition of the present invention is obtained using a hypophosphorous acid compound in an amount of 0.5 to 4.5 parts by mass based on 100 parts by mass of a total of monomers for forming structural units of the acrylic acid-based polymer and adding 1% to 500 by mass of a total amount of the hypophosphorous acid compound to a reactor before supplying the monomer. The phosphorous acid ion is contained in an amount of 20 to 1,000 ppm by mass based on a solid content of the acrylic acid-based polymer.

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Patent Owner(s)

Patent OwnerAddress
TOAGOSEI CO LTD1-14-1 NISHI-SHIMBASHI MINATO-KU TOKYO 105-8419

International Classification(s)

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  • 2016 Application Filing Year
  • C08F Class
  • 2412 Applications Filed
  • 1861 Patents Issued To-Date
  • 77.16 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUJIWARA, Masahiro Nagoya-shi, JP 74 530

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  • 1 Citation Count
  • C08F Class
  • 30.09 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges5171071902496101 - 1011 - 2021 - 3031 - 4041 - 50100 +0501001502002503003504004505005506006507007508008509009501000105011001150

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