Method and system for ion beam delayering of a sample and control thereof
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United States of America Patent
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Jun 23, 2020
Grant Date -
Mar 30, 2017
app pub date -
Dec 14, 2016
filing date -
Nov 10, 2011
priority date (Note) -
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Abstract
There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.
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