Manufacturing method of phthalocyanine crystal by milling crystal transformation for at least 1,000 hours
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United States of America Patent
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Jan 16, 2018
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Nov 28, 2016
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Jun 3, 2014
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Abstract
The present invention provides: an electrophotographic photosensitive member which reduces image defects due to ghosting not only under a normal temperature and normal humidity environment but also even under a low temperature and low humidity environment; and a novel phthalocyanine crystal. The electrophotographic photosensitive member of the present invention comprises a photosensitive layer which comprises a phthalocyanine crystal in which a N,N-dimethylformamide is contained. The content of the N,N-dimethylformamide is 0.1% by mass or more and 1.5% by mass or less based on the phthalocyanine crystal.
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