Importance

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Abstract

The device for plasma processing as per the invention is comprised of a processing chamber with at least two plasma processing zones with process gas flowing through them, a gas inlet that is suitable for feeding the process gas to the at least two plasma processing zones, and a gas outlet that is suitable for discharging exhaust gas from the processing chamber, as well as a circulation unit with a circulation line and a circulation pump, wherein the circulation unit is suitable for feeding at least a portion of the exhaust gas into the gas inlet and wherein the exhaust gas that is fed into the gas inlet is a mixture of gases that are discharged from at least two of the plasma processing zones. Because of the mixture of exhaust gases from at least two of the plasma processing zones and their renewed feeding into the gas inlet, the components of the process gas from the at least two plasma processing zones that have already been converted, but also those that have not yet been converted, are mixed and a homogenization of the process gas is therefore achieved that is fed into the plasma processing zones. This reduces the inhomogeneity of the plasma processing among individual substrates that arises from differences in the plasma process in different plasma processing zones.

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First Claim