Lithographic apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10788763
APP PUB NO 20170068175A1
SERIAL NO

15354821

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Abstract

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A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH
ASML HOLDING N VHOLLAND WEIDE EINDHOVEN VELDHOVEN NORTH BRABANT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bloks, Ruud Hendrikus Martinus Johannes Helmond, NL 28 90
Delmastro, Peter A New Milford, US 10 65
Laurent, Thibault Simon Mathieu Eindhoven, NL 43 333
Leenders, Martinus Hendrikus Antonius Rhoon, NL 136 1474
Nayfeh, Samir A Shrewsbury, US 24 143
Schuster, Mark Josef Fairfield, US 11 57
Van, Boxtel Frank Johannes Jacobus Eindhoven, NL 33 114
Verdirame, Justin Matthew Cambridge, US 10 49
Ward, Christopher Charles Somerville, US 18 77
Westerlaken, Jan Steven Christiaan Heesch, NL 31 95

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