GAS BARRIER LAMINATE
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United States of America Patent
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Issued Date -
Mar 9, 2017
app pub date -
Mar 2, 2015
filing date -
Mar 4, 2014
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Abstract
A gas barrier laminate (10) having a very thin metal oxide film (ALD film) (5) formed on an inorganic oxide layer (3) by an atomic layer deposition method, the inorganic oxide layer (3) including a metal oxide or a metal oxynitride that contains at least either Si or Al, and a ratio (d1/d2) of a thickness (d1) of the inorganic oxide layer (3) and a thickness (d2) of the ALD film (5) being 3 to 50. The gas barrier laminate features not only a high degree of gas-barrier property but also excellent productivity.
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