LIQUID PRECURSOR DELIVERY SYSTEM
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United States of America Patent
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Issued Date -
Mar 2, 2017
app pub date -
Dec 30, 2014
filing date -
May 9, 2014
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Abstract
Disclosed is a liquid precursor delivery system that enables a thin film deposition process to be performed at a low temperature like 350° C. or lower in a process of manufacturing semiconductor devices or displays. The liquid precursor delivery system includes an aerosol generator, a vaporizer, and a vapor storage tank. The aerosol generator changes a liquid precursor into an aerosol precursor using ultrasonic vibrations. The vaporizer has a heater block in which a plurality of sloped plate-shaped heaters is arranged in a zigzag form and in which the aerosol precursor changes into a gas precursor by colliding with the heaters and thus obtaining heat energy. The vapor storage tank stores the gas precursor while maintaining a constant pressure and temperature of the gas precursor and delivers the gas precursor to a process chamber when a thin film deposition process is performed.
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