HIGHLY REFLECTIVE SURFACE PROFILE MEASUREMENT SYSTEM WITH LIQUID ATOMIZATION AND THE METHOD THEREOF

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United States of America Patent

APP PUB NO 20170052022A1
SERIAL NO

14858629

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A highly reflective surface profile measurement system with liquid atomization and a method thereof are both provided. The method includes the following steps: spraying a liquid to form a droplet layer on the surface to reduce temporarily the roughness; scanning the surface by emitting an incident light and receiving a reflected/refracted light to obtain an electric signal; and processing the electric signal to generate an output which carries with the profile or the defect information of the surface.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTENO 195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 31040

International Classification(s)

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  • 2015 Application Filing Year
  • B05B Class
  • 1312 Applications Filed
  • 977 Patents Issued To-Date
  • 74.47 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HUNG, Kuo-Feng Taoyuan, TW 13 20

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  • 1 Citation Count
  • B05B Class
  • 25.49 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges196499521524101 - 1011 - 2021 - 3031 - 4041 - 5051 - 600255075100125150175200225250275300325350375400425450475500525

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