HIGHLY REFLECTIVE SURFACE PROFILE MEASUREMENT SYSTEM WITH LIQUID ATOMIZATION AND THE METHOD THEREOF
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United States of America Patent
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Feb 23, 2017
app pub date -
Sep 18, 2015
filing date -
Aug 17, 2015
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Abstract
A highly reflective surface profile measurement system with liquid atomization and a method thereof are both provided. The method includes the following steps: spraying a liquid to form a droplet layer on the surface to reduce temporarily the roughness; scanning the surface by emitting an incident light and receiving a reflected/refracted light to obtain an electric signal; and processing the electric signal to generate an output which carries with the profile or the defect information of the surface.
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