THIN FILM DEPOSITION APPARATUS
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United States of America Patent
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Issued Date -
Feb 23, 2017
app pub date -
May 26, 2016
filing date -
Aug 19, 2015
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Abstract
A thin film deposition apparatus, including a processing chamber; a boat in the processing chamber, the boat to accommodate a plurality of substrates therein; and a nozzle to supply a source gas to the processing chamber to form a thin film on each of the substrates, the nozzle including a plurality of T-shaped nozzle pipes, each of the T-shaped nozzle pipes including a first pipe having closed ends and a second pipe coupled to a middle portion of the first pipe.
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