VOLUMETRIC SUBSTRATE SCANNER
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United States of America Patent
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Issued Date -
Feb 16, 2017
app pub date -
Apr 21, 2015
filing date -
Apr 21, 2014
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Abstract
A system for scanning a substrate and specifically a volume of that substrate to identify anomalous structures or defects is herein described. Radiation is focused at locations within the volume of the substrate and measurements of scattered light are made. Scanning of the volume of a substrate may be fairly uniform or over selected regions, favoring those regions of the substrate that are to be involved with subsequent substrate processing steps.
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