METHOD OF MANUFACTURE OF MICRO COMPONENTS, AND COMPONENTS FORMED BY SUCH A PROCESS
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United States of America Patent
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Issued Date -
Feb 16, 2017
app pub date -
Apr 22, 2015
filing date -
Apr 23, 2014
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Abstract
A method of forming a multi-level component includes the step of forming at least one arrangement of micro trenches in a predetermined arrangement in a mask material by a lithography process. Another step involves applying one or more etching processes to a surface of a component upon which the mask is applied. The micro trenches have either first or second different aspect ratios. In the applying step, the component is etched by an aspect ratio dependent etch (ARDE) process so as to form an arrangement of micro trenches and micro pillars between adjacent micro trenches. Another step involves removing the arrangement of micro pillars from the component by a removal process. There is also a multi-level component made according to the above method with a first portion at a first level and a further portion of a further level different from the first level.
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