OPTICAL ELEMENT MANUFACTURING METHOD

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United States of America Patent

SERIAL NO

15291310

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Abstract

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It is produced an optical element including a support substrate, a clad layer provided on the support substrate, an optical material layer provided on the clad layer and a fine pattern formed in the optical material layer. The optical element has a warpage of +70 μm or more and +2.0 mm or less. At least a resin layer is formed on the optical material layer. It is used a mold with a design pattern corresponding to the fine pattern formed therein. The design pattern is transferred to the resin layer by an imprinting method. The fine pattern is formed in the optical material layer by a dry etching method. The mold is capable of being deformed conforming to a curve of the resin layer.

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Patent Owner(s)

Patent OwnerAddress
NGK INSULATORS LTD2-56 SUDA-CHO MIZUHO-KU NAGOYA-SHI AICHI-PREFECTURE 467-8530

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ASAI, Keiichiro Nagoya-City, JP 61 378
KONDO, Jungo Miyoshi-City, JP 115 608
TOMITA, Toshihiro Nagoya-City, JP 37 349
YAMAGUCHI, Shoichiro Ichinomiya-City, JP 54 412

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