LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
Jan 26, 2017
app pub date -
Feb 27, 2015
filing date -
Apr 15, 2014
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
Provided is a lithography apparatus that performs a patterning on a substrate. The lithography apparatus includes a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units.
First Claim
Other Claims data not available