LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

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United States of America Patent

APP PUB NO 20170025292A1
SERIAL NO

15302349

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a lithography apparatus that performs a patterning on a substrate. The lithography apparatus includes a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHA30-2 SHIMOMARUKO 3-CHOME OHTA-KU TOKYO

International Classification(s)

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  • 2015 Application Filing Year
  • H01L Class
  • 25498 Applications Filed
  • 22451 Patents Issued To-Date
  • 88.06 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Haginiwa, Kuniyasu Yokohama-shi, JP 6 25
Kotoku, Masashi Yokohama-shi, JP 10 39

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges26979357140748325312788503629173801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +050010001500200025003000350040004500500055006000650070007500800085009000950010000

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