LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
Jan 26, 2017
app pub date -
Feb 27, 2015
filing date -
Apr 15, 2014
priority date (Note) -
Published
status (Latency Note)
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Abstract
Provided is a lithography apparatus that performs a patterning on a substrate. The lithography apparatus includes a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
CANON KABUSHIKI KAISHA | 30-2 SHIMOMARUKO 3-CHOME OHTA-KU TOKYO |
International Classification(s)

- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Haginiwa, Kuniyasu | Yokohama-shi, JP | 6 | 25 |
# of filed Patents : 6 Total Citations : 25 | |||
Kotoku, Masashi | Yokohama-shi, JP | 10 | 39 |
# of filed Patents : 10 Total Citations : 39 |
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Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 8 Age
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