GAS BARRIER FILM AND MANUFACTURING METHOD THEREFOR
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United States of America Patent
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Jan 26, 2017
app pub date -
Nov 10, 2014
filing date -
Nov 29, 2013
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Abstract
The present invention relates to a gas barrier film and a manufacturing method therefor, the gas barrier film comprising: a base; and a barrier layer formed on one surface of the base, wherein the barrier layer has a nitrogen (N) atomic percent of about 1% to about 6%. The gas barrier film, according to the present invention, has an excellent gas barrier property, scratch resistant property, flexibility, transparency and crack prevention effect, and the method for manufacturing the same can be performed by non-vacuum wet coating, and thus a manufacturing time is short, and process performance is excellent.
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