PROCESS FOR REMOVING CONTAMINATION ON RUTHENIUM SURFACE
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United States of America Patent
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Issued Date -
Jan 19, 2017
app pub date -
Jul 13, 2015
filing date -
Jul 13, 2015
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Abandoned
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Abstract
A method for pretreating an EUVL photomask having an exposed ruthenium surface includes subjecting the photomask to surface treatment in an oxidizing and reducing environment. Another method for pretreating an EUVL photomask having an exposed ruthenium surface includes subjecting the photomask to surface treatment in an oxidizing and reducing environment, and cleaning the photomask with a cleaning solution.
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