Reaction chamber and plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10854482
APP PUB NO 20170011938A1
SERIAL NO

15119525

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Abstract

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A reaction chamber is provided. The reaction chamber includes a chamber body, a dielectric window, and a power supplier. The dielectric window is provided on top of the chamber body along a first direction and hermetically connected with the chamber body. Each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the first direction. The plurality of sets of coils are connected in parallel, with first ends electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, and with second ends grounded. The second ends of the plurality of sets of coils are arranged in proximity between the first ends.

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Patent Owner(s)

Patent OwnerAddress
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD100176 8 WENCHANG AVENUE BEIJING ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE BEIJING BEIJING CITY BEIJING CITY 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guan, Changle Beijing, CN 9 1
Li, Dongsan Beijing, CN 3 2
Li, Xingcun Beijing, CN 3 10
Qiu, Mingda Beijing, CN 1 0
Song, Mingming Beijing, CN 2 0
Wei, Gang Beijing, CN 63 360
Zhao, Longchao Beijing, CN 12 3

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