Ion implantation for modification of thin film coatings on glass
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 26, 2017
Issued Date -
N/A
app pub date -
Jul 6, 2016
filing date -
Jul 6, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully