PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF

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United States of America Patent

APP PUB NO 20170003586A1
SERIAL NO

15195730

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention relates to a photosensitive resin composition for black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a compound (F) containing Formula (1). The photosensitive resin composition for black matrix has the advantage of good linearity of pattern with high finesse.

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHOU, HUNG-CHIA TAINAN CITY, TW 4 5
LIAO, HAO-WEI TAINAN CITY, TW 18 48

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