FILM-FORMING STRUCTURE ON WORK AND FILM-FORMING METHOD ON WORK
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United States of America Patent
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Issued Date -
Dec 15, 2016
app pub date -
Aug 7, 2015
filing date -
Jun 11, 2015
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Abstract
A film-forming structure and a film-forming method on a work include closely depositing a thin primary film on a work, the primary film being a suboxide or an oxide including metal and is soft and has insulation properties and corrosion resistance. The primary film is porous film. The work is integrated with the primary film to prevent the primary film from peeling, and thereby improving the workability. The thin secondary film such as a coating is attached to the primary film closely, thereby reducing the amount of paint used. The primary film is integrated with the secondary film to prevent the secondary film from peeling, improving the workability after formation of the secondary film, and thereby forming the primary and secondary films rationally.
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