TEST PATTERN STRUCTURE FOR MONITORING SEMICONDUCTOR FABRICATION PROCESS
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 1, 2016
app pub date -
May 27, 2015
filing date -
May 27, 2015
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
A test pattern structure includes a substrate, a first layer formed over the substrate and including a plurality of box-shaped portions, and a second layer formed over the first layer and including a line portion that continuously extends across centers of the box-shaped portions.
Loading the Abstract Image...
OK
First Claim
Family
Loading Family data...
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully