ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTOMASK
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United States of America Patent
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app pub date -
Aug 5, 2016
filing date -
Feb 21, 2014
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Abandoned
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by specific General Formula (I), and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.
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