PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING, AND METHOD FOR FORMING FINE PATTERN USING THE SAME
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United States of America Patent
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Issued Date -
Nov 17, 2016
app pub date -
Jan 6, 2015
filing date -
Jan 29, 2014
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Abstract
Provided is a photocurable composition that is used for nanoimprinting and can give, on a wafer, a uniform thin film that maintains a uniform thickness without causing uneven resin distribution even after being left stand for a certain time and still enables transfer of, and formation of, a fine pattern with good precision from a mold onto the thin film. The photocurable composition for nanoimprinting includes components (A), (B), (C), and (D) and includes the component (C) in a content of 1 to 30 weight percent based on the total amount (100 weight percent) of the photocurable composition. The component (A) is a cationically curable compound represented by Formula (1). The component (B) is a cationic photoinitiator. The component (C) is a hydroxy-containing solvent having a boiling point of 100° C. to 210° C. (at 760 mmHg). The component (D) is a solvent that is devoid of hydroxy, has a boiling point of 140° C. to 210° C. (at 760 mmHg), and has monomer solubility in terms of solubility parameter of 8.0 to 10.0 (cal/cm3)1/2.
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