APPARATUS AND METHOD FOR REGULATING THE TEMPERATURE IN A PROCESS CHAMBER OF A CVD REACTOR USING TWO TEMPERATURE SENSOR DEVICES
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Nov 17, 2016
app pub date -
Dec 15, 2014
filing date -
Dec 15, 2014
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
An apparatus and a method for a thermal treatment, in particular a coating of a substrate, includes a heating device which is regulated by a regulating device which interacts with a first temperature sensor device. In order to counteract a temperature drift of the first temperature sensor device, a second temperature sensor device is used to detect the temperature drift and recalibrate the first temperature sensor device. The second temperature sensor device is used to measure the surface temperature of a substrate. This measured value is compared with a desired value, and if the desired value deviates from the measured actual value, a correction factor is formed and is used to apply the measured value used to regulate the heating device to the first temperature sensor device in order to bring the actual temperature value measured by the second temperature sensor device closer to the associated desired temperature value.
First Claim
Other Claims data not available