APPARATUS AND METHOD FOR REGULATING THE TEMPERATURE IN A PROCESS CHAMBER OF A CVD REACTOR USING TWO TEMPERATURE SENSOR DEVICES

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United States of America Patent

APP PUB NO 20160333479A1
SERIAL NO

15105515

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus and a method for a thermal treatment, in particular a coating of a substrate, includes a heating device which is regulated by a regulating device which interacts with a first temperature sensor device. In order to counteract a temperature drift of the first temperature sensor device, a second temperature sensor device is used to detect the temperature drift and recalibrate the first temperature sensor device. The second temperature sensor device is used to measure the surface temperature of a substrate. This measured value is compared with a desired value, and if the desired value deviates from the measured actual value, a correction factor is formed and is used to apply the measured value used to regulate the heating device to the first temperature sensor device in order to bring the actual temperature value measured by the second temperature sensor device closer to the associated desired temperature value.

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Patent Owner(s)

Patent OwnerAddress
AIXTRON SEDORNKAULSTR 2 52134 HERZOGENRATH 52134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boyd, Adam Kelmis, BE 16 54
Lauffer, Peter Sebald Aachen, DE 8 9
Lindner, Johannes Roetogen, DE 16 463
Silva, Hugo Aachen, DE 7 386
Theres, Arne Stolberg, DE 1 3

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