GRAPHENE NANORIBBON PRECURSORS AND MONOMERS SUITABLE FOR PREPARATION THEREOF

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20160333141A1
SERIAL NO

15219747

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
BASF SELUDWIGSHAFEN GERMANY LUDWIGSHAFEN RHINELAND-PALATINATE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DOESSEL, Lukas Darmstadt, DE 2 1
FENG, Xinliang Mainz, DE 21 152
MUELLEN, Klaus Koeln, DE 62 493
SCHWAB, Matthias Georg Mannheim, DE 18 74

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation