Methods of forming conductive and insulating layers
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United States of America Patent
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Jan 9, 2018
Issued Date -
N/A
app pub date -
Jul 5, 2016
filing date -
Jun 27, 2013
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Abstract
Methods of forming conductive and insulating layers for semiconductor devices and packages. Substrate is provided with integrated circuit device and interconnect structure mounted thereon, the interconnect structure adjacent the integrated circuit device. The integrated circuit device and portions of the interconnect structure can be covered with an encapsulation exposing a portion of the interconnect structure. Conductive material is formed over the exposed portion of the interconnect structure by a depositing process followed by a heating process to alter the chemical properties of the conductive material. Optionally, a dispersing process may be incorporated.
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