COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING SAME
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United States of America Patent
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app pub date -
Jul 21, 2016
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Oct 11, 2011
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Abandoned
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Abstract
[Object] To provide a composition enabling to form a fine negative photoresist pattern free from troubles, such as, surface roughness, bridge defects, and resolution failure; and also to provide a pattern formation method using that composition.
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