Mirror blank for EUV lithography without expansion under EUV radiation

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United States of America Patent

PATENT NO 10732519
APP PUB NO 20160320715A1
SERIAL NO

15024236

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Abstract

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A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.

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Patent Owner(s)

Patent OwnerAddress
HERAEUS QUARZGLAS GMBH & CO KGQUARZSTRASSE 8 HANAU 63450

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Becker, Klaus Hanau, DE 107 1044
Thomas, Stephan Großkrotzenburg, DE 22 331

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