PROCESS FOR PRODUCING A BLOCK COPOLYMER FILM ON A SUBSTRATE
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United States of America Patent
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Nov 3, 2016
app pub date -
Dec 10, 2014
filing date -
Dec 13, 2013
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Abstract
The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.
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