CYCLIC ORGANOAMINOSILANE PRECURSORS FOR FORMING SILICON-CONTAINING FILMS AND METHODS OF USING THE SAME
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United States of America Patent
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Issued Date -
Oct 27, 2016
app pub date -
Jun 30, 2016
filing date -
Jun 30, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed are methods for forming a silicon-containing layer on a substrate, the method comprising the steps of introducing into a reactor containing a substrate a vapor including an Si-containing film forming composition having a cyclic organoaminosilane precursor having the formula:
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International Classification(s)
- 2016 Application Filing Year
- H01L Class
- 27971 Applications Filed
- 23507 Patents Issued To-Date
- 84.05 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 362 Citation Count
- H01L Class
- 99.15 % this patent is cited more than
- 9 Age